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Fused Silica

Low-Expansion Fused Silica Powder for Semiconductor Epoxy Molding Compounds

Low-expansion fused silica powder for semiconductor epoxy molding compound screening in advanced packaging. Reference chemistry includes SiO2 >99.90% and Fe2O3 <50 ppm; select PSD and purity against filler loading, flow, warpage, ionic contamination and package-reliability targets.

Specifications

Mesh Size
120mesh,200mesh,325mesh,600mesh,800mesh,1250mesh,2000mesh,2500mesh,3000mesh,5000mesh
Particle Size
3-5mm,1-3mm,1-0.5mm,0.5-0.2mm,0.1-0.2mm,0.1-0mm(120mesh),0.075mm(200mesh)
SiO₂ Content
99.8-99.99%
Bulk Density
1.0~1.5 g/cm³
Specific Gravity
2.20 g/cm³‌
Thermal Expansion
0.5*10⁻⁶
Moh's hardness
7



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